AC dielectric properties of SiO2 thin layers implanted with In and Sb ions

Abstrakt

In this paper results of AC measurements of phase angle theta, capacity C-p and loss tangent tg delta dependences on frequency and temperature for InSb-SiO2 nanocomposite, immediately after preparation are presented. The material was obtained by the implantation of In+ and Sb+ ions into a thin layer of SiO2. Based on mathematical and physical calculations, frequency dependence of conductivity sigma and relative permittivity epsilon(r) were determined. Activation energy of electrons was also calculated. This work refers to the hopping mechanism of conductivity.

Autorzy

Tomasz N. Kołtunowicz
Tomasz N. Kołtunowicz
Aleksander K. Fedotov
Aleksander K. Fedotov
inne publikacje
Referat zjazdowy konferencji międzynarodowej
Proceedings of SPIE, the International Society for Optical Engineering
2018 Vol. 10808 Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018, 2018, Wilga, Poland. ISBN: 978-1-5106-2204-3
Angielski
2018
108085K
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